Hao Jin

Research Fellow

Centre of Sustainable Energy Systems (CSES), Australian National University

Phone: (61 2) 6125 9741

Fax: (61 2) 6125 0506

Email: hao.jin@anu.edu.au

Education:

09/2007- : Research Fellow, Centre of Sustainable Energy Systems (CSES), Australian National University

05/2004-05/2007:

Ph.D candidate in Centre of Sustainable Energy Systems (CSES), Australian National University

09/1999-07/2003

Engineering Bachelor in Thermal Dynamic Engineering department (Energy department) at Tsinghua University, Beijing, China

Research area:

Advanced surface passivation for Solar Cell. (AR coating properties, diffusion effects)

Surface defect characterization; Anti-reflection coat properties.

characterization

Award:

03/2008

Chinese excellent Self funded student Award

(supported by the Chinese government)

Publications

Publications in academic journal:

K.J. Weber and H. Jin, ‘Improved silicon surface passivation achieved by negatively charged silicon nitride’ applied physics letter,94, 063509, 2009

Hao Jin, K.J. Weber and C. Zhang, ‘Effect of phosphorus diffusion to the recombination at the Si-SiO2 interface’ Progress in Photovoltaics: Research and Applications, 17, 177-181, 2009
 

Hao Jin, W. Jellett, C. Zhang, K.J. Weber , P. Smith , A. Blakers ‘The effect of boron diffusions on the defect density and recombination at the (111)Silicon-Silicon Oxide interface’, Apply Physic Lettter, 92(12) , 122109, 2008 .

Hao Jin, K. J. Weber, N. C. Dang, and W. E. Jellett,‘Defect generation at the Si–SiO2 interface following corona charging’, Apply Physic Lettter, 90(26), 262109, 2007

 
Hao Jin, K.J. Weber and A.W. Blakers, Hydrogen Passivation of LPCVD Si3N4/SiO2/Si Stacks by Ammonia Plasma Treatment, Journal of The Electrochemical Society. 154(6), H430-H434
 
Hao Jin, K.J. Weber and P.J. Smith, Characterization of the Si-SiO2 interface following room temperature ammonia plasma exposure, Journal of The Electrochemical Society. 154(6), H417-H421

Hao Jin and K.J. Weber, The Effect of Low Pressure Chemical Vapor Deposition of Silicon Nitride on the Electronic Interface Properties of Oxidised Silicon Wafers, Progress in Photovoltaics: Research and Applications, 2007, vol. 15(5) , pp. 405-414

Hao Jin and K.J. Weber, The effect of LPCVD silicon nitride deposition on the Si-SiO2 interface of oxidised silicon wafers Journal of The Electrochemical Society. 154(1), H5-H8, 2007

Hao Jin, K.J.Weber, W. Li and A. Blakers, Introduction of atomic H into Si3N4/SiO2/Si stacks, Rare metals, Vol 25, Spec. issue, 150-152, 2006

Hao Jin, K.J.Weber, A. Jayaprasad, P.J. Smith and A. Blakers, Si-SiO2 interface passivation by plasma NH3 and atomic H, Rare metals, Vol 25, Spec. issue, 146-149, 2006

Hao Jin, P.J. Smith and K.J. Weber, Introduction of Surface Defects on Oxidized Silicon by LPCVD Silicon Nitride Deposition, Appl. Phys. Lett., 89(9), 092120-1 - 092120-3, 2006

Hao Jin, K.J.Weber, P.N.K. Deenapanray and A.W.Blakers, Hydrogen Reintroduction by Forming Gas Annealing to LPCVD Silicon Nitride Coated Structures, Journal of The Electrochemical Society, 153(8), G750-G754, 2006

Publications in academic conference:

More than 20 publications in academic conference.